China's EUV technology 15 years behind ASML, UBS pointed out in a report - Singaporean media
This article was automatically translated from Japanese by AI. The original Japanese version is the authoritative source.
Record China 2026/9/3 11:00
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On the 2nd, Singaporean newspaper Lianhe Zaobao reported that analysts at Swiss financial giant UBS expressed the view that it would be difficult for China to establish an alternative to cutting-edge EUV lithography equipment within the next 10 years, regarding China's semiconductor manufacturing technology.
On the 2nd, Singaporean newspaper Lianhe Zaobao reported that analysts at Swiss financial giant UBS expressed the view that it would be difficult for China to establish an alternative to cutting-edge EUV lithography equipment within the next 10 years, regarding China's semiconductor manufacturing technology.
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